CNSI NanoLab

California NanoSystems Institute (CNSI)

nano technology

Overview

The UCLA NanoLab provides open-access to advanced research infrastructure for fabrication and characterization of nanoscale materials, systems and devices. With over 15,000 square feet of class 10, 100 and 1000 cleanroom space, the NanoLab integrates modern semiconductor tools, processes and analysis using substrates ranging in size from small pieces to 150mm wafers with emerging classes of biomedically relevant materials and devices. By providing access to a professional staff with deep knowledge of fabrication techniques and process development, the UCLA NanoLab enables a broad range of academic and industrial R&D projects.

Leadership

Contact

Email: nanolab@ucla.edu

Phone: 310-206-8923

Website: NanoLab

Equipment

Lithography

  1. JEOL JSM-6610 Scanning Electron Microscope
  2. ASML PAS 5500/200 – Stepper
  3. Headway Spin Coater
  4. Heidelberg DWL 66 LaserWriter
  5. HF-Buffered Oxide Etch
  6. Karl Suss MA6 Aligner
  7. Nitrogen-Purged Muffle Furnace
  8. SVG 8800 Tack Coater & Developer
  9. Raith EBPG 5000+ES - Electron Beam Writer

Deposition

  1. CHA Mark 40 Evaporator
  2. CHA Solution E-Beam Evaporator
  3. Deposition Oxidation - Tystar
  4. Deposition LPCVD Nitride Low Stress - Tystar
  5. Deposition LPCVD Tystar Titan II
  6. Deposition LPCVD Nitride/Poly/LTO
  7. Deposition LPCVD Nitride
  8. Deposition PECVD - Plasma Therm 790
  9. Deposition PECVD BMR Technology
  10. Deposition - CVC 601 Sputterer
  11. Denton Desk II Deposition Sputterer
  12. Denton Desk V Thin Film Deposition System
  13. Denton Discovery Sputterer
  14. Ultratech Fiji - Atomic Layer Deposition
  15. Polifab STS Multiplex CVD Deposition System
  16. Ultratech Savannah Atomic Layer Deposition
  17. SCS PDS 2010 Parylene Deposition
  18. G&P Technology Poli 400L
  19. Jelight UV Cleaner
  20. Karl Suss SB8 Wafer Bonder
  21. Logitech PM5 Polisher/Grinder
  22. Loomis LSD-100
  23. Tousimis 915B Critical Point Dryer

Measurement

  1. AST Goniometer
  2. CDE ResMap
  3. Dektak 6 Surface Profile Measuring System
  4. Vecco Dektak 8 Profilometer
  5. FEI Nova 600 Nanolab DualBeam SEM/FIB
  6. Hitachi S4700 SEM
  7. Leica DM2500 Microscope
  8. M&M Probe Station
  9. Nanometrics Nanospec 210/2100 Thin Film Measuring System
  10. Measurment Microscopes
  11. Prometrix Omnimap RS35C
  12. SCI Filmtek 2000
  13. Sopra GES5 Elipsometer
  14. Tencor Flexus 2320A Stress Tester
  15. ULVAC UNECS-2000 Elipsometer
  16. Vecco Dektak 150 Surface Profiler
  17. Vecco Dilnnova Atomic Force Microscope
  18. Wyko NT3300 Optical Profiler

Thermal

  1. YES LPIII - HMDS Thermal Oven
  2. Tystar Therm Anneal
  3. Carbolite High Temperature Oven
  4. Modular Process Technology RTP 650
  5. Modular Process Technology RTP-600xp
  6. VWR Vacuum Oven
  7. YES-LPIII Vacuum Oven

Chemical

  1. Chemical Wet Benches (CNSI)
  2. Chemical Wet Benches (E-IV)
  3. SemiTool Spin Rinse Dryer

Backend

  1. LogiTech CDP
  2. Fusion UV Systems
  3. G&P Technology Poli 400L
  4. Jelight UV Cleaner
  5. Karl Suss SB8 Wafer Bonder
  6. Logitech PM5 Polisher/Grinder
  7. Loomis LSD-100
  8. Tousimis 915B Critical Point Dryer

Miscellaneous

  1. Z-Test Software